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ANALYSIS REFRACTIVE INDEX AND FILM THICKNESS OF CRYSTALLINE TA2O5 THIN FILMS BY ELLIPSOMETER

H. Darmasetiawan (a), Irzaman (a), M Hikam (b) dan Na Peng Bo (b)

(a) Department of Physics, FMIPA IPB, Jl. Raya Pajajaran Bogor, Indonesia
(b) Department of Physics, FMIPA University Indonesia, Kampus Depok, Indonesia

Abstract
Tantalum oxide (Ta2O5) thin films were deposited on Si(100) using the chemical solution deposition (CSD) method. X-ray diffraction (XRD) and ellipsometer were employed to characterize the films. The growth condition of Ta2O5 was carried out by spin coating at 2000, 2250, 2500, 2750 and 3000 rpm for 30 seconds, and then annealing at 900oC for 15 hours. The microstructure and crystallinity of thin films were analyzed by XRD preferred orientation (001), (010); (200). The results of refractive indices (n) and films thickness (d) were measured by ellipsometer were 1.8 - 1.94 and 1368 - 2150 nm respectively.

Publication : Physics Journal IPS Proceeding Supplement A6 (2002) 0530
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Additional info : 5 pages, language English